Demonstration of Low Loss RF Conductor in Ka and V Bands Using Cu/Fe multilayers for 5G and Millimeter Wave Applications
In this paper we report the first demonstration of a low loss RF conductor in Ka and V bands using metaconductors consisting of multiple nanolayers of copper (Cu) and Iron (Fe). Resistance reduction is achieved in the frequency range between 26-67GHz which covers millimeter (mm) wave frequency bands for 5G applications. Design and simulations are performed in High Frequency Structural Simulator (HFSS) and it is experimentally verified using 1mm Coplanar Waveguide Transmission Lines (CPWTL) which are microfabricated using 5 pairs of 150 nm Cu and 25 nm Fe. Nearly, 0.17 dB improvement in insertion loss at 61 GHz is demonstrated using the Cu/Fe metaconductor compared to the solid Cu conductor.